Batch Process For The Fabrication Of Linbo_3 Photonic Crystals Using Proton Exchange Followed By Chf_3 Reactive Ion Etching

摘要

We report a simple process for the batch fabrication of photonic crystals in lithium niobate substrates. By means of proton-exchange (PE) followed by CHF_3 reactive ion etching (RIE) we have achieved structures with a diameter of 400 nm and an aspect ratio (depth-to-diameter) of 3:1. Sub-micrometric structures have been fabricated with an 85° angle between the walls and the plane of the substrate. We provide the optimized parameters - and their influence on the aspect ratio, the etching rate and the verticality of the walls. Transversal cross-section micrographs of the etched patterns, for both X-cut and Z-cut substrates, are shown as a clear evidence of the capability developed.