首页>
外国专利>
METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTALS USING A SINGLE PLANAR ETCH MASK AND DEEP REACTIVE-ION/PLASMA ETCHING
METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTALS USING A SINGLE PLANAR ETCH MASK AND DEEP REACTIVE-ION/PLASMA ETCHING
展开▼
机译:利用单平面刻蚀掩模和深反应离子/等离子刻蚀制造三维光子晶体的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A three dimensional photonic crystal including a matrix formed of a contiguous solid material and method of manufacturing. The matrix surrounds a plurality of substantially spherical voids. The voids are arranged in a predetermined pattern which forms a plurality of planar layers. These plurality of layers are stacked so that the voids in each layer are aligned to form vertical columns with voids from at least a subset of the other layers. The voids in each vertical column have openings between adjacent voids in the column.
展开▼