首页> 外国专利> METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTALS USING A SINGLE PLANAR ETCH MASK AND DEEP REACTIVE-ION/PLASMA ETCHING

METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTALS USING A SINGLE PLANAR ETCH MASK AND DEEP REACTIVE-ION/PLASMA ETCHING

机译:利用单平面刻蚀掩模和深反应离子/等离子刻蚀制造三维光子晶体的方法

摘要

A three dimensional photonic crystal including a matrix formed of a contiguous solid material and method of manufacturing. The matrix surrounds a plurality of substantially spherical voids. The voids are arranged in a predetermined pattern which forms a plurality of planar layers. These plurality of layers are stacked so that the voids in each layer are aligned to form vertical columns with voids from at least a subset of the other layers. The voids in each vertical column have openings between adjacent voids in the column.
机译:包括由连续的固体材料形成的基质的三维光子晶体及其制造方法。基质围绕多个基本上球形的空隙。空隙以预定图案布置,该预定图案形成多个平面层。堆叠这些多个层,使得每一层中的空隙对准以形成具有至少来自其他层的子集的空隙的垂直柱。每个垂直柱中的空隙在柱中相邻空隙之间具有开口。

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