首页> 外文期刊>Optical Materials >Impact of sulfur content on structural and optical properties of Ge_(20)Se_(80-x)S_x chalcogenide glasses thin films
【24h】

Impact of sulfur content on structural and optical properties of Ge_(20)Se_(80-x)S_x chalcogenide glasses thin films

机译:硫含量对Ge_(20)Se_(80-x)S_x硫族化物玻璃薄膜结构和光学性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Chalcogenide system Ge20Se80-xSx (x = 0, 15 and 30%) thin films were prepared by thermal evaporation technique. The amorphous state of the samples was confirmed according to XRD. The structural changes occurring upon replacement Se by S was investigated using Raman spectroscopy. The optical properties of the as-deposited Ge20Se80-xSx thin films have been studied by analysis the transmittance T(lambda) measured at room temperature in the wavelength range 200-2500 nm using Swanepoel's method. Urbach energy (E-e) and optical band gap (E-g) were strongly affected by sulfur concentration in the sample. The refractive index evaluated through envelope method was extrapolated by Cauchy dispersion relationship over the whole spectral range. Moreover, the dispersion of refractive index was analyzed in terms of the single-oscillator Wemple-Di Domenico model. The third-order nonlinear susceptibility (chi((3))) and nonlinear refractive index (n(2)) were calculated and discussed for different Ge20Se80-xSx (x = 0, 15 and 30%). (C) 2018 Elsevier B.V. All rights reserved.
机译:通过热蒸发技术制备硫族化物体系Ge20Se80-xSx(x = 0、15和30%)薄膜。根据XRD确认样品的非晶态。使用拉曼光谱研究了用S替代Se后发生的结构变化。通过使用Swanepoel方法分析室温下在200-2500 nm波长范围内测得的透射率T(λ),研究了沉积的Ge20Se80-xSx薄膜的光学特性。样品中的硫浓度强烈影响Urbach能量(E-e)和光学带隙(E-g)。在整个光谱范围内,通过柯西色散关系推断通过包络线法评估的折射率。此外,根据单振荡器的Wemple-Di Domenico模型分析了折射率的色散。计算和讨论了不同Ge20Se80-xSx(x = 0、15和30%)的三阶非线性磁化率(chi((3)))和非线性折射率(n(2))。 (C)2018 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号