...
机译:溅射功率对室温下射频磁控溅射生长的SiO_2膜性能的影响
School of Materials Science and Engineering Tianjin Polytechnic University Tianjin 300387 China Institute of Spacecraft System Engineering Beijing 100086 China;
School of Materials Science and Engineering Tianjin Polytechnic University Tianjin 300387 China State Key Laboratory of Membrane Separation and Membrane Process Tianjin 300387 China;
School of Materials Science and Engineering Tianjin Polytechnic University Tianjin 300387 China State Key Laboratory of Membrane Separation and Membrane Process Tianjin 300387 China;
Institute of Spacecraft System Engineering Beijing 100086 China;
Institute of Spacecraft System Engineering Beijing 100086 China;
SiO_2 film; O/Si ratio; Sputtering power; Transmittance; Magnetron sputtering; Antireflection;
机译:溅射功率和退火温度对射频磁控溅射技术制备的AI_2O_3:CuO薄膜的结构和光学性能的影响
机译:在不同温度下在a-Al_2O_3衬底上生长的射频磁控溅射a-(Cr_(1-x)Al_x)_2O_3薄膜的光学特性
机译:MgO溅射功率对射频磁控溅射生长的MgZnO薄膜特性的依赖性
机译:溅射功率对通过射频磁控溅射沉积的ZnO / SiO_2膜的结构和光学性质的作用
机译:碲化镉和碲化锌薄膜以及太阳能电池的射频磁控三极管溅射。
机译:射频直流和射频叠加直流磁控溅射沉积的透明导电掺铝ZnO多晶薄膜的载流子输运和晶体学取向特征
机译:使用射频磁控溅射在$ Pt / Ti / SiO_2 / Si $衬底上沉积的$ CaCu_3Ti_4O_ {12} $薄膜的沉积和介电特性