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机译:在不同温度下在a-Al_2O_3衬底上生长的射频磁控溅射a-(Cr_(1-x)Al_x)_2O_3薄膜的光学特性
Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM-AWP);
Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM-AWP);
Karlsruhe Institute of Technology (KIT), Institute of Functional Interfaces (IFG);
Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM-AWP);
Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM-AWP);
Chromium aluminum oxide; Thin film; Raman spectroscopy; Infrared reflection absorption spectroscopy, UV–visible spectroscopy;
机译:用r.f法在α-Al_2O_3衬底上合成局部外延α-(Cr_(1-x)Al_X)_2O_3薄膜(0.08≤x≤0.16)。磁控溅射
机译:反应射频磁控溅射在Si衬底上生长的Zn_(1-x)Cd_xO薄膜的光电性能
机译:射频磁控溅射制备铟锡氧化物/石英衬底上Ba_xSr_(1-x)TiO_3薄膜的结构和光学性质
机译:射频磁控溅射在不同衬底温度下沉积的纳米结构氧化锌薄膜的光学性质
机译:通过90度离轴溅射原位生长的高临界转变温度超导薄膜和多层膜的合成和性能。
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:RF磁控溅射在玻璃基板上生长的热处理GA掺杂ZnO薄膜的结构和光学性质