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Influence of bath temperatures on physical and electrical properties of potentiostatically deposited Cu_2O thin films for heterojunction solar cell applications

机译:镀液温度对异质结太阳能电池应用恒电位沉积Cu_2O薄膜的物理和电学性能的影响

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摘要

In the present work, the influence of bath temperatures on structural, morphological, vibrational, optical, electrical and photo response properties of the electrochemically deposited cuprous oxide (Cu2O) thin films on fluorine doped tin oxide substrate is extensively investigated with the help of X-ray diffraction (XRD), scanning electron microscopy (SEM), Micro Raman spectroscopy, photo luminescence (PL) spectroscopy, UV-visible spectroscopy, LCR measurement, Keithley 4200 semiconductor characterization system respectively. XRD patterns reveal that the deposited Cu2O films have cubic structure grown along the preferential (111) orientation and the film deposited at 40 A degrees C shows better crystalline nature when compared at 55 and 70 A degrees C. The micro structural properties of films such as crystallite size (D), dislocation density (delta), micro strain (epsilon) and stacking fault probability (alpha) were calculated and discussed in detail. SEM displays a well-defined three side pyramid shaped morphology for the film deposited at 40 A degrees C. Micro Raman and PL spectra reveal the film deposited at 40 A degrees C by being better crystalline at a higher acceptor concentration. UV-Visible study shows that the optical energy band gap increases from 2.05 to 2.17 eV with an increase in bath temperature from 40 to 70 A degrees C. The frequency-temperature dependence of impedance analysis shows a higher electrical conductivity for a film deposited at 40 A degrees C compared to other bath temperatures. I-V measurement illustrates a good photoconductivity response for Cu2O thin film deposited at 40 A degrees C compared to films deposited at 55 and 70 A degrees C.
机译:在目前的工作中,借助于X-射线,广泛研究了浴温对氟掺杂氧化锡基底上电化学沉积的氧化亚铜(Cu2O)薄膜的结构,形态,振动,光学,电和光响应特性的影响。射线衍射(XRD),扫描电子显微镜(SEM),微拉曼光谱,光致发光(PL)光谱,紫外可见光谱,LCR测量,吉时利4200半导体表征系统。 XRD图谱显示,沉积的Cu2O薄膜具有沿优先(111)取向生长的立方结构,并且在55和70 A的温度下沉积时,在40 A的温度下沉积的薄膜显示出更好的结晶性。计算并详细讨论了微晶尺寸(D),位错密度(δ),微应变(ε)和堆垛层错概率(α)。 SEM显示了在40 A摄氏度下沉积的薄膜的轮廓清晰的三棱锥形形态。MicroRaman和PL光谱揭示了在40 A摄氏度下沉积的薄膜在较高的受体浓度下具有更好的结晶性。 UV-Visible研究表明,随着浴温从40 A升高到70 A C,光能带隙从2.05升高到2.17 eV。阻抗分析的频率-温度依赖性显示,在40°C沉积的膜具有更高的电导率与其他浴温相比,摄氏度。 I-V测量表明,与在55和70 A摄氏度下沉积的薄膜相比,在40 A摄氏度下沉积的Cu2O薄膜具有良好的光电导响应。

著录项

  • 来源
    《Optical and quantum electronics》 |2019年第1期|37.1-37.16|共16页
  • 作者单位

    Alagappa Univ, Adv Mat & Thin Film Lab, Dept Phys, Karaikkudi 630003, Tamil Nadu, India|Saiva Bhanu Kshatriya Coll, Dept Phys, Aruppukottai 626101, Tamil Nadu, India;

    Annamalai Univ, Dept Phys CISL, Chidambaram 608002, Tamil Nadu, India;

    Alagappa Univ, Adv Mat & Thin Film Lab, Dept Phys, Karaikkudi 630003, Tamil Nadu, India;

    Alagappa Univ, Adv Mat & Thin Film Lab, Dept Phys, Karaikkudi 630003, Tamil Nadu, India;

    Alagappa Univ, Adv Mat & Thin Film Lab, Dept Phys, Karaikkudi 630003, Tamil Nadu, India;

    Alagappa Univ, Adv Mat & Thin Film Lab, Dept Phys, Karaikkudi 630003, Tamil Nadu, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Cuprous oxide; X-ray diffraction; Pyramid shape; Micro Raman spectroscopy; Photoconductivity;

    机译:氧化亚铜;X射线衍射;金字塔形状;显微拉曼光谱;光电导;

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