Farbication of UV photodetector from nickel oxide nanoparticles deposited on silicon substrate by closed-field unbalanced dual magnetron sputtering techniques

摘要

In this work, a UV photodetector was fabricated by depositing 25 nm nickel oxide nanoparticles on an n-type silicon substrate by a closed-field unbalanced dual magnetron sputtering technique. The fabricated photodetector showed maximum spectral responsivity of 4.8 mA/W at 318 nm with maximum quantum efficiency of 1.87 %. This is good attempt to produce such nanostructures with high quality and low cost for UV detection application.