PROPERTIES OF TI-SI-N NANOCOMPOSITE COATINGS DEPOSITED BY CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING

摘要

Ti-Si-N coatings with different silicon contents were deposited by reactive magnetron sputtering. These coatings were characterized and analyzed by using a variety of analytical techniques. The Ti-Si-N coating shows a denser structure as compared with TiN coating, and consists of TiN crystallites and amorphous Si_3N_4 phase. The maximum hardness and Young's Modulus of 52 GPa and 360 GPa respectively are achieved as the Si content was 8.6 at.%. The Ti-Si-N coating with 8.6 at.% Si shows the excellent oxidation resistance behavior and perfect anti-wear performance.