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Molecular dynamics simulations of Coulomb explosion

机译:库仑爆炸的分子动力学模拟

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摘要

A swift ion creates a track of electronic excitations in the target material. A net repulsion inside the track can cause a "Coulomb explosion" (CE), which can lead to damage and sputtering of the material. Here we report results from molecular dynamics simulations of CEs for cylindrical tracks as a function of charge density and neutralization/quenching time, τ. Screening by the free electrons is accounted for using a screened Coulomb potential for the interaction among charges. The yield exhibits a prompt component from the track core and a component from the heated region produced, which dominates at higher excitation density. For the cases studied, the number of atoms ejected per incident ion, i.e. the sputtering yield Y, is quadratic with charge density along the track as suggested by simple models. Y does not depend greatly on τ for τ approx> τ_D (one Debye period), and even Y (τ = 0.2τ_D) is still nearly 20% of the yield when there is no neutralization (τ → ∞). The connections between 'CEs', thermal spikes and measurements of electronic sputtering are discussed.
机译:快速离子在目标材料中产生电子激发的轨迹。轨道内的净排斥力可能导致“库仑爆炸”(CE),从而导致材料损坏和溅射。在这里,我们报告了圆柱轨道的CE分子动力学模拟结果与电荷密度和中和/淬灭时间τ的关系。通过自由电子的筛选是通过使用筛选出的库仑电势进行电荷之间的相互作用来解释的。收率表现出来自磁道芯的迅速成分和产生的加热区域的成分,这些成分在较高的激发密度下占主导地位。对于所研究的情况,如简单模型所建议的那样,每个入射离子喷射的原子数(即溅射产率Y)是二次的,沿着轨迹的电荷密度较高。当τ大约>τ_D(一个德拜周期)时,Y并没有很大程度地依赖于τ,即使没有中和(τ→∞),甚至Y(τ=0.2τ_D)仍接近产量的20%。讨论了“ CE”,热尖峰和电子溅射测量之间的联系。

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