首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Variable-energy positron annihilation lifetime and Doppler broadening of the annihilation line study of carbon-implanted polyethylene
【24h】

Variable-energy positron annihilation lifetime and Doppler broadening of the annihilation line study of carbon-implanted polyethylene

机译:碳注入聚乙烯的可变能量正电子an灭寿命和多普勒展宽的line灭线研究

获取原文
获取原文并翻译 | 示例

摘要

The variable-energy positron annihilation lifetime (VEPAL) and Doppler broadening of the annihilation line (VEDBAL) techniques were applied to study structural changes in ultra-high molecular weight polyethylene after implantation with 30-keV carbon ions with fluences of 5 x 10~(14), 5 x 10~(15), 5 x 10~(16) ions/cm~2. The influence of a subsequent γ-irradiation of 30-kGy dose on the structure of the samples was also studied. For the VEPAL study, a simple macroscopic model was used to model the behavior of the ortho-positronium intensity and lifetime versus the incident positron energy. An increase in the number of free-volume holes and a decrease in their sizes were observed for a subsurface layer. A considerable inhibition of positronium formation was found in a middle layer. The determined depth position and thickness of the middle layer was in satisfactory agreement with the carbon ions stopping range calculated by the TRIM (transport of ions in matter) code only for the lowest carbon-ion implantation fluence. A shifting of the middle layer towards larger depths and layer broadening for the higher carbon-ion implantation fluences were established. The VEDBAL information was not as rich as the VEPAL data. In some cases, a determination of the closer to the surface boundary of the middle layer was even impossible.
机译:应用可变能量正电子an灭寿命(VEPAL)和多普勒展宽line灭线(VEDBAL)技术研究超高分子量聚乙烯在注入30-keV碳离子,注量为5 x 10〜( 14),5 x 10〜(15),5 x 10〜(16)离子/ cm〜2。还研究了随后的30 kGy剂量的γ辐照对样品结构的影响。对于VEPAL研究,使用了一个简单的宏观模型对正-正电子强度和寿命与正电子入射能量之间的关系进行建模。对于地下层,观察到自由体积孔的数量增加和尺寸减小。在中间层中发现了对正电子形成的显着抑制。所确定的中间层的深度位置和厚度与仅针对最低碳离子注入通量的TRIM(物质中离子的传输)代码所计算的碳离子停止范围令人满意地一致。建立了较高碳离子注入通量的中间层向更大深度的转移和层扩展。 VEDBAL信息不如VEPAL数据丰富。在某些情况下,甚至不可能确定更接近中间层的表面边界。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号