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Silicon field emission array as novel charge neutralization device for high current ion implanter

机译:硅场发射阵列作为大电流离子注入机的新型电荷中和装置

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We propose use of silicon field emission array as a novel charge neutralization device for ion implanter. Fundamental characteristics of the emitted electrons, i.e. energy distribution and operation in high vacuum were investigated. As a result, energy spread was narrow enough but unexpected energy peak shift was observed. To reduce the energy spread and peak shift, a FEA with less number of tips and with narrower gate diameter is necessary. The FEA could be operated about 100 h in high vacuum. (c) 2005 Elsevier B.V. All rights reserved.
机译:我们建议将硅场发射阵列用作离子注入机的新型电荷中和装置。研究了发射电子的基本特征,即高真空下的能量分布和操作。结果,能量散布足够窄,但是观察到了意外的能量峰位移。为了减少能量散布和峰位移,必须使用尖端数量较少且浇口直径更窄的FEA。 FEA可以在高真空下运行约100小时。 (c)2005 Elsevier B.V.保留所有权利。

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