Optimization of ECR ion sources for high charge state beam generation

摘要

The most important developments in the field of ion sources have been based on the generation of warm plasmas by means of microwaves at different frequencies.rnDifferent type of sources as electron cyclotron resonance ion sources (ECRIS) and microwave discharge ion sources have been designed and built at INFN-LNS, at operating frequencies between 2.45 and 28 GHz, with different purposes ranging from high efficiency ionization or high current production of light ions to high charge state generation of heavy ion beams.rnThe production of intense beams of highly charged ions (HCIs) has been a major task in the last few years.rnDifferent solutions have been proposed to improve the production rate. In particular the microwave coupling to plasma can be significantly improved with beneficial effects on ion beam current.rnExperimental activities in the field of microwave coupling to plasmas at different frequencies (14, 18 and 28 GHz) along with theoretical modelling of the plasma formation and confinement have been undertaken to improve production of HCI.rnThe description of the different methods and tasks to improve the performances of such sources will be carried out, along with a scenario of the existing and forthcoming ECRIS for HCI production.