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Aberration coefficients of multi-element cylindrical electrostatic lens systems for charged particle beam applications

机译:带电粒子束应用的多元件柱面静电透镜系统的像差系数

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In order to analyze the imaging properties of an electrostatic lens system, it is necessary to know how various sources of aberration combine to increase the size of final image or spot. In this paper, we investigated the spherical and chromatic aberration coefficients of multi-element electrostatic lens systems as a function of the lens voltages and magnification, using the electron ray tracing simulation programs SIMION and LENSYS. These programs can be used to obtain electron optical aberration integrals which involve the axial potential distribution and its derivative, and two independent trajectories and their derivatives for the determination of the third- or fifth-order aberration coefficients of multi-element lenses. Optical simulation of the intensity distribution has quantitatively shown that the aberration in the crossover image causes an electron beam blur and a positioning error on the focus spot. If a high positive voltage with respect to the first element's potential is applied to the lens elements, the aberrations as well as the minimum beam divergence can be reduced. The reason, obtained from numerical simulation, is that a positive voltage increases the electron velocity, shortening the electron drift time across the region with aberrant field.
机译:为了分析静电透镜系统的成像特性,有必要知道各种像差源如何组合以增加最终图像或斑点的尺寸。在本文中,我们使用电子射线追踪模拟程序SIMION和LENSYS,研究了多元件静电透镜系统的球差和色差系数与透镜电压和放大率的关系。这些程序可用于获得涉及轴向电势分布及其导数的电子光学像差积分,以及两个独立的轨迹及其导数,用于确定多元件透镜的三阶或五阶像差系数。强度分布的光学模拟已定量显示交叉图像中的像差会导致电子束模糊和焦点上的定位误差。如果将相对于第一元件的电势的高的正电压施加到透镜元件,则可以减小像差以及最小的光束发散。从数值模拟中得出的原因是,正电压会增加电子速度,从而缩短电子在具有异常电场的区域上的漂移时间。

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