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Performance studies of a monolithic scintillator-CMOS image sensor for X-ray application

机译:X射线应用单片闪烁器-CMOS图像传感器的性能研究

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We proposed the direct deposition of CsI(Tl) scintillator layer with pixelated structure on a CMOS image sensor (CIS) in order to improve the spatial resolution. CMOS sensors developed for test have a 128 x 128 photodiode array with 50 μm pixel pitch and integrated readout-electronics including a 10 bit pipe-lined ADC. CsI(Tl) layer has thickness of 50 μm. The modulation transfer function, the noise power spectrum, and the detective quantum efficiency of pixelated and non-pixelated CsI(Tl) X-ray image sensors (XIS) were estimated with a 50kVp X-ray beam. At 10% of modulation transfer function (MTF), the spatial resolution of pixelated and non-pixleated XIS are about 8 and 61p/mm, respectively. It implies that pixelation enhances the spatial resolution by reducing the lateral light diffusion. Though the NPS of pixelated XIS was slightly higher than the non-pixelated XIS, its detective quantum efficiency (DQE) values were much better than non-pixelated XIS especially at high spatial frequencies.
机译:我们提出将具有像素化结构的CsI(Tl)闪烁体层直接沉积在CMOS图像传感器(CIS)上,以提高空间分辨率。为测试而开发的CMOS传感器具有像素间距为50μm的128 x 128光电二极管阵列和集成的读出电子器件,包括10位流水线ADC。 CsI(Tl)层的厚度为50μm。用50kVp X射线束估算像素化和非像素化CsI(Tl)X射线图像传感器(XIS)的调制传递函数,噪声功率谱和检测量子效率。在调制传递函数(MTF)的10%时,像素化和非像素化XIS的空间分辨率分别约为8p和61p / mm。这意味着像素化可通过减少横向光扩散来提高空间分辨率。尽管像素化XIS的NPS略高于非像素化XIS,但其探测量子效率(DQE)值要比非像素化XIS更好,特别是在高空间频率下。

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