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Seeded growth of large single-crystal copper foils with high-index facets

机译:具有高索引面的大型单晶铜箔的种子生长

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摘要

Abstract The production of large single-crystal metal foils with various facet indices has long been a pursuit in materials science owing to their potential applications in crystal epitaxy, catalysis, electronics and thermal engineering1–5. For a given metal, there are only three sets of low-index facets ({100}, {110} and {111}). In comparison, high-index facets are in principle infinite and could afford richer surface structures and properties. However, the controlled preparation of single-crystal foils with high-index facets is challenging, because they are neither thermodynamically6,7 nor kinetically3 favourable compared to low-index facets6–18. Here we report a seeded growth technique for building a library of single-crystal copper foils with sizes of about 30 × 20 square centimetres and more than 30 kinds of facet. A mild pre-oxidation of polycrystalline copper foils, followed by annealing in a reducing atmosphere, leads to the growth of high-index copper facets that cover almost the entire foil and have the potential of growing to lengths of several metres. The creation of oxide surface layers on our foils means that surface energy minimization is not a key determinant of facet selection for growth, as is usually the case. Instead, facet selection is dictated randomly by the facet of the largest grain (irrespective of its surface energy), which consumes smaller grains and eliminates grain boundaries. Our high-index foils can be used as seeds for the growth of other Cu foils along either the in-plane or the out-of-plane direction. We show that this technique is also applicable to the growth of high-index single-crystal nickel foils, and we explore the possibility of using our high-index copper foils as substrates for the epitaxial growth of two-dimensional materials. Other applications are expected in selective catalysis, low-impedance electrical conduction and heat dissipation.
机译:摘要由于其晶体外延,催化,电子和热工程1-5潜在的应用,长期以来,具有各个方面指数的大型单晶金属箔的生产长期以来一直追求材料科学。对于给定金属,只有三组低索引面({100},{110}和{111})。相比之下,高索引面原理是无限的,并且可以负担更丰富的表面结构和性能。然而,与高指数面的单晶箔的受控制剂是具有挑战性的,因为与低指标面部6-18相比,它们既不是热力学均衡的6,7也不是有利的。在这里,我们报告了一种用于构建单晶铜箔库的种子生长技术,尺寸约为30×20平方厘米和超过30种面部。温和的多晶铜箔预氧化,然后在还原气氛中退火,导致高折射率铜平面的生长,该铜平面几乎覆盖整个箔,并且具有成长为几米长的潜力。在我们的箔上的氧化物表面层的产生意味着表面能量最小化不是平面选择的主要决定因子,因为通常情况下。相反,方面选择由最大晶粒的面部随机地(无关,无关其表面能),这消耗较小的晶粒并消除晶界。我们的高折射率箔可用作种子用于沿着平面内或外平方向的其他Cu箔的生长。我们表明,该技术也适用于高指数单晶镍箔的生长,并且我们探讨了使用我们的高折射率铜箔作为二维材料外延生长的基板的可能性。预期其他应用在选择性催化,低阻抗导电和散热中。

著录项

  • 来源
    《Nature》 |2020年第7809期|406-410|共5页
  • 作者单位

    Peking University|Peking University|Chinese Academy of Sciences;

    Peking University;

    South China Normal University;

    Peking University;

    Institute for Basic Science|Shandong University;

    Institute for Basic Science;

    Peking University;

    Peking University;

    Peking University|Chinese Academy of Sciences;

    Peking University;

    Southern University of Science and Technology;

    Peking University;

    Beijing University of Technology;

    Shandong University;

    Peking Union Medical College Hospital;

    Peking University;

    Beijing University of Technology;

    Peking University;

    Chinese Academy of Sciences;

    Peking University|Huairou National Comprehensive Science Centre;

    Eidgenössische Technische Hochschule Zürich;

    Institute for Basic Science|Ulsan National Institute of Science and Technology;

    Southern University of Science and Technology;

    Peking University|Chinese Academy of Sciences|Liaoning University;

    Peking University|Peking University;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:15:26

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