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One-pot growth of two-dimensional lateral heterostructures via sequential edge-epitaxy

机译:通过顺序边缘外延一锅生长二维横向异质结构

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摘要

Two-dimensional heterojunctions of transition-metal dichalcogenides(1-15) have great potential for application in low-power, high-performance and flexible electro-optical devices, such as tunnelling transistors(5,6), light-emitting diodes(2,3), photodetectors(2,4) and photovoltaic cells(7,8). Although complex heterostructures have been fabricated via the van der Waals stacking of different two-dimensional materials(2-4,14), the in situ fabrication of high-quality lateral heterostructures(9-13,15) with multiple junctions remains a challenge. Transition-metal-dichalcogenide lateral heterostructures have been synthesized via single-step(9,11,12), two-step(10,13) or multi-step growth processes(15). However, these methods lack the flexibility to control, in situ, the growth of individual domains. In situ synthesis of multi-junction lateral heterostructures does not require multiple exchanges of sources or reactors, a limitation in previous approaches(9-13,15) as it exposes the edges to ambient contamination, compromises the homogeneity of domain size in periodic structures, and results in long processing times. Here we report a one-pot synthetic approach, using a single heterogeneous solid source, for the continuous fabrication of lateral multi-junction heterostructures consisting of monolayers of transition-metal dichalcogenides. The sequential formation of heterojunctions is achieved solely by changing the composition of the reactive gas environment in the presence of water vapour. This enables selective control of the water-induced oxidation(16) and volatilization(17) of each transition-metal precursor, as well as its nucleation on the substrate, leading to sequential edge-epitaxy of distinct transition-metal dichalcogenides. Photoluminescence maps confirm the sequential spatial modulation of the bandgap, and atomic-resolution images reveal defect-free lateral connectivity between the different transition-metal-dichalcogenide domains within a single crystal structure. Electrical transport measurements revealed diode-like responses across the junctions. Our new approach offers greater flexibility and control than previous methods for continuous growth of transition-metal-dichalcogenide-based multi-junction lateral heterostructures. These findings could be extended to other families of two-dimensional materials, and establish a foundation for the development of complex and atomically thin in-plane superlattices, devices and integrated circuits(18).
机译:过渡金属二卤化物(1-15)的二维异质结在隧穿晶体管(5,6),发光二极管(2)等低功率,高性能和柔性电光器件中具有广阔的应用前景,3),光电探测器(2,4)和光伏电池(7,8)。尽管已经通过范德华堆叠不同的二维材料来制造复杂的异质结构(2-4,14),但是具有多个结的高质量横向异质结构(9-13,15)的原位制造仍然是一个挑战。过渡金属二卤化物横向异质结构是通过单步生长(9,11,12),两步生长(10,13)或多步生长过程(15)合成的。但是,这些方法缺乏就地控制单个域的生长的灵活性。多结横向异质结构的原位合成不需要多次交换离子源或反应堆,这是以前方法的局限性(9-13,15),因为它将边缘暴露于环境污染中,损害了周期性结构中畴尺寸的均匀性,并导致处理时间长。在这里,我们报告了一种使用单一异质固体源的单锅合成方法,用于连续制造由过渡金属二卤化物单层组成的横向多结异质结构。仅通过在水蒸气存在下改变反应性气体环境的组成来实现异质结的顺序形成。这使得能够选择性控制每个过渡金属前体的水诱导氧化(16)和挥发(17),以及其在基材上的成核作用,从而导致不同过渡金属二卤化物的顺序边缘外延。光致发光图确认了带隙的连续空间调制,并且原子分辨率图像揭示了单晶结构内不同过渡金属-二卤化物域之间的无缺陷横向连接。电迁移测量表明,跨结的二极管状响应。与以前的方法相比,我们的新方法为过渡金属-二卤化物基多结横向异质结构的连续生长提供了更大的灵活性和控制力。这些发现可以扩展到其他二维材料系列,并为开发复杂且原子薄的平面超晶格,器件和集成电路奠定基础(18)。

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  • 来源
    《Nature》 |2018年第7686期|63-67|共5页
  • 作者单位

    Univ S Florida, Dept Phys, Tampa, FL 33620 USA;

    Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA|Florida State Univ, Dept Phys, Tallahassee, FL 32306 USA;

    Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA;

    Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA|Florida State Univ, Dept Phys, Tallahassee, FL 32306 USA;

    Univ S Florida, Dept Phys, Tampa, FL 33620 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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