Fabrication of silicon-based two-dimensional photonic crystals

摘要

Both triangular lattice and square lattice photonic crystals with lattice constant 400 nm and the radius 200 nm of the air pores in the silicon substrate have been designed, fabricated and realized. The processes of the fabrication of the two-dimensional photonic crystals, based on silicon, including mask making, electron-beam lithography, and inductively coupled plasma etching are introduced.