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Fabrication of high hardness Ni mold with electroless nickel–boron thin layer

机译:化学镀镍硼薄层高硬度镍模的制作

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The nickel electroforming method using a high-concentration nickel sulfamate bath is commonly used to fabricate micro metal molds in the LIGA process; however, this method does not produce micro metal molds of sufficient hardness. One means of improving the hardness of micro metal molds made using the nickel electroforming method is to include additives in the nickel plating solution. Another method is nickel alloy plating or a similar technique. In this research, we used a nickel–boron (Ni–B) electroless alloy plating method to obtain a hard nickel plated film having hardness of 832 Hv. It was also ascertained that Ni–B electroless alloy plated film retains its high hardness even during heat treatment in conditions of 250°C for 1 h. To deal with the high stresses developed in high-hardness plated films, we proposed double-layer nickel electroforming. This method is covered and used on conventional nickel electroforming layer by high hardness micro mold. High hardness micro metal mold using double-layer was fabricated by nickel electroforming and Ni–B electroless alloy plating method.
机译:使用高浓度氨基磺酸镍镀液的镍电铸方法通常用于制造LIGA工艺中的微型金属模具。但是,这种方法不能生产出足够硬度的微型金属模具。改善使用镍电铸法制造的微金属模具的硬度的一种方法是在镍镀液中包含添加剂。另一种方法是镀镍合金或类似技术。在这项研究中,我们使用镍-硼(Ni-B)化学镀方法获得了硬度为832 Hv的硬镍镀膜。还可以确定,即使在250°C的条件下进行1小时的热处理,Ni-B化学镀合金膜仍保持其高硬度。为了应对高硬度镀膜中产生的高应力,我们提出了双层镍电铸工艺。该方法通过高硬度微模具覆盖并用于常规的镍电铸层上。通过镍电铸和Ni-B化学合金电镀法制造了采用双层的高硬度微金属模具。

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