首页> 外国专利> METHOD FOR CONSTITUTING ELECTROLESS NICKEL PLATING LAYER ON METALLIC MOLD SURFACE AND METALLIC MOLD FOR RESIN SEALING OF ELECTRONIC PARTS

METHOD FOR CONSTITUTING ELECTROLESS NICKEL PLATING LAYER ON METALLIC MOLD SURFACE AND METALLIC MOLD FOR RESIN SEALING OF ELECTRONIC PARTS

机译:在电子零件的树脂密封中的金属模具表面和金属模具上构成化学镀镍层的方法

摘要

PURPOSE:To improve the adhesive property of a Ni plating layer and the release property of a resin molding by interposing a plating layer contg. elements having a high diffusion coefft. to the blank material of the metallic mold and the electroless Ni plating layer between both at the time of forming the above- mentioned plating layer on the above-mentioned surface. CONSTITUTION:The electroless Ni plating layer A is formed on the blank mate rial surface of the metallic mold for the resin sealing and molding of electronic parts, for example, a passage 17 for transporting of a molten resin material consisting of the upper mold cavity 171 and upper mold gate 172 corresponding to the position of a pot 15, upper and lower cavities 111, 121, an air vent 112, etc. The plating layer C, such as Cu plating or electrolytic Ni plating, contg. the elements having the high diffusion coefft. to the blank material surface B of the metallic mold and the Ni plating layer A is interposed between both. The plating layer C to be interposed is preferably formed as the film as thin as about 0.1 to 5mu.
机译:目的:通过插入一层连续的镀层来提高镍镀层的粘附性和树脂成型品的脱模性。扩散系数高的元素。在上述表面上形成上述镀层时,金属模具的毛坯材料和化学镀Ni层之间的厚度不均。组成:化学镀镍层A形成在金属模具的坯料表面上,用于树脂密封和成型电子零件,例如,通道17,用于输送由上模腔171构成的熔融树脂材料对应于罐15的位置的上部模具浇口172和上部和下部腔体111、121,通气口112等。诸如Cu镀层或电解Ni镀层的镀层C续。具有高扩散系数的元素。在金属模具的坯料表面B上镀有镍,镀镍层A介于两者之间。插入的镀层C优选形成为薄至约0.1至5μ的膜。

著录项

  • 公开/公告号JPH03104874A

    专利类型

  • 公开/公告日1991-05-01

    原文格式PDF

  • 申请/专利权人 TOOWA KK;

    申请/专利号JP19890239785

  • 发明设计人 OSADA MICHIO;

    申请日1989-09-14

  • 分类号C23C18/18;B29C33/38;B29C45/37;B29L31/34;C23C18/32;H01L21/56;

  • 国家 JP

  • 入库时间 2022-08-22 06:05:30

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