首页> 外国专利> HIGH-HARDNESS ELECTROLESS NICKEL-BORON PLATING LIQUID AND PLATING METHOD USING THIS LIQUID

HIGH-HARDNESS ELECTROLESS NICKEL-BORON PLATING LIQUID AND PLATING METHOD USING THIS LIQUID

机译:高硬度化学镀镍硼液及使用该液的镀层方法

摘要

PURPOSE: To obtain a high-hardness plating film without subjecting the film to a high-temp. treatment by allowing borate ions and ammonium ions to exist into an electroless nickel-boron plating liquid. ;CONSTITUTION: This electroless Ni-B plating liquid is prepd. by incorporating nickel ions, boric acid-based reducing agent, borate ions and ammonium ions into the liquid. The high-hardness film is obtd. by using this plating liquid without subjecting the film to the high-temp. treatment and, therefore, the deformation of a blank material having low heat resistance is prevented. Plating is executable with precise dimensional accuracy even with the blank material with which the deformation, etc., do not arise. In addition, the film is made smooth and is improved in the appearance by adding amines, such as alkanol amine, to the above-mentioned plating liquid.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:获得高硬度的镀膜,而无需对其进行高温处理。通过使硼酸根离子和铵离子存在于化学镀镍硼镀液中来进行处理。 ;组成:准备这种化学镀Ni-B液。通过将镍离子,硼酸基还原剂,硼酸根离子和铵离子掺入液体中。高硬度膜是钝的。通过使用这种镀液而不使膜经受高温。因此,可以防止耐热性低的坯料变形。即使不产生变形等的毛坯材料,也可以以精确的尺寸精度进行电镀。另外,通过向上述电镀液中加入链烷醇胺等胺,可以使薄膜光滑并改善外观。COPYRIGHT:(C)1993,JPO&Japio

著录项

  • 公开/公告号JPH05331654A

    专利类型

  • 公开/公告日1993-12-14

    原文格式PDF

  • 申请/专利权人 DEITSUPUSOOLE KK;

    申请/专利号JP19920136969

  • 发明设计人 ONUKI ATSUSHI;SATO ATSUSHI;MURAI TOSHIAKI;

    申请日1992-05-28

  • 分类号C23C18/34;

  • 国家 JP

  • 入库时间 2022-08-22 04:48:38

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