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INFLUENCE OF THE ANIONIC PART OF THE STABILIZER ON ELECTROLESS NICKEL-BORON PLATING

机译:稳定器阴离子部分对电镀镍 - 硼电镀的影响

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Electroless plating is a process during which metallic salts (in our case nickel salts) are reduced in an aqueous medium by a chemical reducing agent. Selectivity and smooth operation of the process require that a stabilizing agent is used. It operates by blocking catalytic activity on unwanted germination sites and regulating the activity of the substrate. In the case of alkaline electroless nickel-boron plating systems, which use sodium (or potassium) borohydride as reducing agent, lead and thallium salts are the most popular stabilizers. However, there is little knowledge about the way the stabilizer acts. In this study, 4 different lead-based stabilizers (tungstate, sulphate, nitrate and chloride) have been used, all other things left constant, in electroless nickel-boron plating baths. The thickness, composition, roughness, morphology, hardness and structure of all the obtained coatings have been investigated. Chloride led to thinner deposits and the boron content varied between 5.5 wt.% for lead tungstate and 6.5 wt.% for lead nitrate and lead sulphate, with a lead content between 0.2 and 0.25 wt.%. This shows the influence of the anionic part of the stabilizing agent on the plating process.
机译:化学镀是通过化学还原剂在水性介质中减少金属盐(在我们的壳体镍盐)的过程中。该方法的选择性和平稳操作要求使用稳定剂。它通过阻断对不需要的发芽位点的催化活性并调节基材的活性来操作。在碱性电镀镍 - 硼电镀系统的情况下,使用钠(或钾)硼氢化钠作为还原剂,铅和铊盐是最流行的稳定剂。但是,关于稳定器的方式几乎没有了解。在本研究中,已经使用了4种不同的铅稳定剂(钨酸盐,硫酸盐,硝酸盐和氯化物),所有其他东西在化学镀镍镀浴中留下恒定。研究了所有得到的涂层的厚度,组成,粗糙度,形态,硬度和结构。氯化物导致较薄的沉积物,硼含量在5.5重量%之间变化。铅钨酸盐的%和6.5重量%。铅硝酸铅和铅硫酸铅,铅含量为0.2和0.25重量%。这表明稳定剂的阴离子部分对电镀过程的影响。

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