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Analysis and design of a new SRAM memory cell based on vertical lambda bipolar transistor

机译:基于垂直λ双极晶体管的新型SRAM存储单元的分析与设计

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摘要

A voltage-controlled negative-differential-resistance device using a merged integrated circuit of two n-channel enhancement-mode MOSFETs and a vertical NPN bipolar transistor, called vertical Lambda-bipolar-transistor (VLBT), is presented for memory application. The new VLBT structure has been developed and its characteristics are derived by a simple circuit model and device physics. A novel single-sided SRAM cell based on the proposed VLBT is presented. Due to the characteristics of the VLBT, it offers better static noise margin and larger driving capability as compared with conventional single-side CMOS memory cell.
机译:提出了一种压控负差分电阻器件,该器件使用两个n沟道增强模式MOSFET和一个垂直NPN双极晶体管(称为垂直Lambda双极晶体管(VLBT))的合并集成电路,用于存储器应用。已经开发出新的VLBT结构,其特性是通过简单的电路模型和器件物理原理得出的。提出了一种基于提出的VLBT的新型单面SRAM单元。由于VLBT的特性,与传统的单面CMOS存储单元相比,它具有更好的静态噪声容限和更大的驱动能力。

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