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A 3.6 mW 1.4 V SRAM with non-boosted, vertical bipolar bitline contact memory cell

机译:具有非增强型垂直双极性位线接触式存储单元的3.6 mW 1.4 V SRAM

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Low-voltage SRAMs operating at >3 V are currently used for handy terminals. However, demand for lower-voltage operation has increased. It is difficult to reduce operating voltage below 2.5 V with a conventional low-power SRAM with 4-nMOS-transistor cell. Although a full CMOS cell or a boosted word line technique could reduce operating voltage, they have certain problems, i.e., a larger cell or elaborate timing control for boost. This 256 kb, low-power SRAM uses a bipolar bit line contact (BBC) memory cell, and features small cell, low operating voltage, low power dissipation and fast access.
机译:手持终端目前使用工作在> 3 V的低压SRAM。然而,对低压操作的需求增加了。使用具有4 nMOS晶体管单元的常规低功耗SRAM很难将工作电压降低至2.5 V以下。尽管完整的CMOS单元或增强型字线技术可以降低工作电压,但它们具有某些问题,即,较大的单元或用于增强的精细定时控制。这款256 kb低功耗SRAM使用双极性位线接触(BBC)存储单元,并具有小单元,低工作电压,低功耗和快速访问的特点。

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