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首页> 外文期刊>Microelectronics journal >Barrier height inhomogeneities in a Ni/SiC-6H Schottky n-type diode
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Barrier height inhomogeneities in a Ni/SiC-6H Schottky n-type diode

机译:Ni / SiC-6H肖特基n型二极管的势垒高度不均匀性

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摘要

Two models have been used in order to explain the anomalies observed in a Ni/SiC-6H Schottky n-type diode I(V) characteristic. Both, parallel conduction and potential fluctuation models showed that the barrier's height is around a mean value of 1.86 V, corresponding to a factor of ideality of n = 1. Another conclusion was that φ_B~i = φ_B~C = 1.88 V. It has been, also, explained why the Arrhenius or Richardson plot (ln(I_s/T~2) versus 1/T) is not linear and why the area of the low barrier height A_1, representing a defective zone, is approximately about 0.12% of the total area contact.
机译:为了解释在Ni / SiC-6H肖特基n型二极管I(V)特性中观察到的异常,使用了两个模型。并行传导模型和电势波动模型均显示,势垒的高度约为1.86 V的平均值,对应于理想因子n =1。另一个结论是φ_B〜i =φ_B〜C = 1.88V。还解释了为什么Arrhenius或Richardson图(ln(I_s / T〜2)对1 / T)不是线性的,为什么低势垒高度A_1的面积(代表缺陷区域)大约是0.12%总面积联系。

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