机译:用于在32 nm技术节点中进行严格过程控制的高级光刻模型
Institute of Microelectronics (MEL), NCSR Demokritos, Aghia Paraskevi Athens 15310, Greece Department of Electronics, TEI of Athens, 12210 Aegaleo, Greece Department of Electronics, TEI of Peiraias, 12244 Aegaleo, Greece;
Institute of Microelectronics (MEL), NCSR Demokritos, Aghia Paraskevi Athens 15310, Greece Department of Electronics, TEI of Athens, 12210 Aegaleo, Greece;
Institute of Microelectronics (MEL), NCSR Demokritos, Aghia Paraskevi Athens 15310, Greece;
Institute of Microelectronics (MEL), NCSR Demokritos, Aghia Paraskevi Athens 15310, Greece;
Fraunhofer Institute of Integrated Systems and Device Technology (FhG IISB), Schottkystrasse 10, 91058 Erlangen, Germany;
mesoscale simulation; molecular resists; high resolution lithography; LER;
机译:面向32 nm节点ArF浸没光刻的双图案化材料和工艺的开发
机译:先进的28/32 nm技术节点中基于双向SCR网络的紧凑型ESD器件Beta-Matrix解决方案
机译:栅极堆栈结构和过程缺陷对32nm技术节点PMOSFET中NBTI可靠性高kdielix依赖性的影响
机译:改进32nm光刻工艺覆盖控制的高级建模策略
机译:先进光刻胶工艺中反应动力学的建模和仿真。
机译:栅堆叠结构和工艺缺陷对32 nm工艺节点PMOSFET中NBTI可靠性的高k介电依赖性的影响
机译:用于双图案化朝向32nm节点ARF浸入光刻的材料和工艺的开发
机译:燃煤电厂综合环境控制先进过程的建模与评估。总结报告