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机译:质子束写入法制备的高纵横比PMMA微结构用于压印光刻的Ni模具的电铸
Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;
Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;
Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;
Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Japan Atomic Energy Agency, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan;
Dept. of Electrical Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu. Koto-kit, Tokyo 135-8548, Japan;
Litho Tech Japan Corporation, 2-6-6-201 Namiki, Kawaguchi, Saitama 332-0034, Japan;
proton beam writing; mold; electroforming; imprint lithography;
机译:使用通过质子束写入制造的高纵横比微结构进行电镀
机译:质子束写法在PMMA上介电电泳与凹坑阵列组装金纳米颗粒
机译:通过介电泳组装金纳米颗粒,通过质子梁写入制造的PMMA与PIMMA阵列
机译:光刻使用聚焦的高能质子束,用于制造高纵横比微结构
机译:通过深紫外线,X射线,电子束和质子束辐照辐射诱导的PMMA改性和降解来增强聚甲基丙烯酸甲酯的敏感性。
机译:在PMMA上通过电子束直接写入制成的具有石墨电极的全碳基石墨烯场效应晶体管
机译:基于全碳的石墨烯场效应晶体管,具有通过电子束直接写入PMMA制造的石墨电极
机译:用质子束写入印章制作微光学元件的纳米压印