机译:用于电子束光刻的微型导流板的精密组装
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany;
Vistec Electron Beam GmbH, Goeschwitzer Str. 25, 07745 Jena, Germany;
Vistec Electron Beam GmbH, Goeschwitzer Str. 25, 07745 Jena, Germany;
Vistec Electron Beam GmbH, Goeschwitzer Str. 25, 07745 Jena, Germany;
Vistec Electron Beam GmbH, Goeschwitzer Str. 25, 07745 Jena, Germany;
electron beam lithography; wire deflector; electron-optical column; precision assembly; solderjet bumping; multi shaped beam; computed tomography measurement;
机译:基于扫描电子显微镜的高速高精度偏转器在电子束光刻系统中的应用
机译:电子束平版机X-Y精密工作台升降机构的结构特征
机译:电子束光刻机X-Y精密工作台升降机结构的特点
机译:基于电子束平版印刷效应的一维硅纳米线的制备
机译:用于多束电子束光刻的薄膜栅极光阴极。
机译:像差校正电子束光刻对悬浮石墨烯器件电子传输的影响的原位研究
机译:纳米级精密电子束光刻技术及其在集成光学中的应用