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机译:通过纳米压印和O_2等离子体刻蚀制备双层金属线栅偏振片
Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan, ROC;
Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan, ROC;
Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan, ROC;
Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan, ROC;
insertion structure; protrusion structure; bi-layered structure; metallic wire-grid polarizer (WGP); nanoimprint; O_2 plasma etching;
机译:使用卷对卷纳米压印和等离子微调的亚15纳米线宽光栅,以制造具有低色偏的柔性线栅偏振器
机译:通过纳米压印技术制造的太赫兹区域的线栅偏振片
机译:通过纳米压印技术制造的太赫兹区域的线栅偏振片
机译:使用EUV干涉和纳米压印光刻技术制造的用于DUV到IR的双层线栅偏振器
机译:用于制造新型器件的宽带隙半导体材料的高密度等离子体蚀刻。
机译:使用纳米球刻蚀,软刻蚀和等离子刻蚀制造的等离子纳米结构
机译:用FIB-CVD和RIE制造的模具的定期纳米孔结构的金属玻璃纳米压印