Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography

摘要

We present the design of a bilayer metallic wire-grid polarizer (WGP) optimized for operation in the deep-ultraviolet (DUV) region, and their high-throughput fabrication of over large areas by nanoimprint lithography (NIL). The master imprint stamps were fabricated using our newly developed scanning exposure strategy with extreme ultraviolet interference lithography (EUV-IL). Optical measurements show that the fabricated bi-layer polarizer covers a broad spectral range, starting from wavelength of 280 nm. TM transmission of 50%, and an extinction ratio of 20 dB (10²) were realized.