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首页> 外文期刊>Microelectronic Engineering >Effect of pyrolysis temperature on the electrical, optical, structural, and morphological properties of ITO thin films prepared by a sol-gel spin coating process
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Effect of pyrolysis temperature on the electrical, optical, structural, and morphological properties of ITO thin films prepared by a sol-gel spin coating process

机译:热解温度对溶胶-凝胶旋涂法制备ITO薄膜的电学,光学,结构和形貌性能的影响

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摘要

Tin doped indium oxide (ITO) thin films were fabricated by sol-gel spin coating (S-G-S) method with In(NO_3)_3·H_2O and SnCl_4 as indium and tin precursors, respectively. Polyvinylalcohol (PVA) was used for synthesis of ITO sol as a stabilizer and binder. The influence of different pyrolysis temperatures after each coating on the electrical, optical, structural, and morphological properties of the films were characterized by means of four point probe, UV-Vis, FT-IR spectroscopy, X-ray diffraction and scanning electron microscopy (SEM). Then the prepared thin films were annealed in the temperature of 550 ℃ under argon atmosphere (the rate of 100 mL/min and the pressure of 10 Torr). The obtained results indicate that minimum resistivity of 12.5 × 10~(-4) Ω cm and optical transmittance of more than 83% in the UV-Vis region with a band gap of 3.84 eV were achieved for the films pyrolyzed at 500 ℃ for 30 min. X-ray diffraction analysis confirmed the formation of cubic bixbyite structure of indium oxide by the main peak of the (222) plane. The grain size of ITO nanoparticles was obtained about 25-50 nm and the thickness of the film was investigated by SEM surface images and cross-section images, respectively and the effect of Burstein-Moss on optical band gap of sample was discussed too.
机译:采用溶胶-凝胶旋涂(S-G-S)法分别以In(NO_3)_3·H_2O和SnCl_4作为铟和锡的前驱体,制备了掺锡的氧化铟(ITO)薄膜。聚乙烯醇(PVA)用于合成ITO溶胶,作为稳定剂和粘合剂。借助四点探针,UV-Vis,FT-IR光谱,X射线衍射和扫描电子显微镜,表征了每个涂层之后不同的热解温度对薄膜的电,光学,结构和形态性能的影响( SEM)。然后将制得的薄膜在氩气气氛下以550℃的温度(速率为100 mL / min,压力为10 Torr)退火。结果表明,在500℃下热解30℃时,薄膜的最小电阻率为12.5×10〜(-4)Ωcm,带隙为3.84 eV的UV-Vis区域的透光率大于83%。分钟X射线衍射分析通过(222)面的主峰确认了氧化铟的立方方铁锰矿结构的形成。获得了ITO纳米颗粒的粒径约25-50 nm,并分别通过SEM表面图像和横截面图像研究了膜的厚度,并讨论了Burstein-Moss对样品光学带隙的影响。

著录项

  • 来源
    《Microelectronic Engineering》 |2014年第11期|40-45|共6页
  • 作者单位

    Department of Physics (Solid state), Iran University of Science and Technology, Narmak, Tehran 16846-13114, Iran;

    Department of Physics (Solid state), Iran University of Science and Technology, Narmak, Tehran 16846-13114, Iran;

    Department of Chemistry, Iran University of Science and Technology, Narmak, Tehran 16846-13114, Iran;

    Department of Chemistry, Iran University of Science and Technology, Narmak, Tehran 16846-13114, Iran;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TCO; Tin doped indium oxide; Sol-gel; Resistance; Transmittance;

    机译:TCO;锡掺杂的氧化铟;溶胶凝胶抵抗性;透过率;

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