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Methyl red/ indium-tin-oxide organic diode: An electrical and optoelectronic study

机译:甲基红/铟锡氧化物有机二极管:电学和光电学

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摘要

Methyl red / indium-tin-oxide (ITO) organic diode is fabricated by simple, low cost solution drop casting method. Using the conventional Tauc method, the optical bandgap of methyl red is calculated 2.23 eV from the measured absorbance data. The electrical analyses of methyl red/ITO structure are carried out based on the thermionic emission model of Schottky barrier diode. The ideality factor, barrier height and series resistance are calculated using the standard method (5.40, 0.88 eV, 10(6) Omega), Bohlin's method (5.20, 0.87 eV, 1.5 x 10(6) Omega) and Cheung's method (4.88, 0.85 eV, 9 x 10(6) Omega) and the values of such parameters are in close agreement. In the optoelectronic study, a considerable improvement in photocurrent under steady illumination reveals a substantial photosensitivity of the device. The diode is also proved as a stable photo-switch owing to its fine photo absorbing quality. The photo response of the test structure is attributed to the presence of methyl red over layer and the phenomena is ascribed by the delocalization of pi electrons from the conjugated structure between the benzene and azo groups of methyl red.
机译:甲基红/铟锡氧化物(ITO)有机二极管是通过简单,低成本的溶液滴铸法制造的。使用常规的Tauc方法,根据测得的吸光度数据计算出甲基红的光学带隙为2.23 eV。基于肖特基势垒二极管的热电子发射模型对甲基红/ ITO结构进行了电学分析。使用标准方法(5.40,0.88 eV,10(6)Omega),Bohlin方法(5.20,0.87 eV,1.5 x 10(6)Omega)和Cheung方法(4.88, 0.85 eV,9 x 10(6)Omega)和这些参数的值非常一致。在光电研究中,稳定照明下光电流的显着改善表明该器件具有显着的光敏性。由于其优良的光吸收质量,该二极管还被证明是稳定的光开关。测试结构的光响应归因于在层上存在甲基红,并且该现象归因于pi电子从甲基红的苯和偶氮基之间的共轭结构中脱位。

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