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首页> 外文期刊>Journal of Microelectromechanical Systems >Design of sealed cavity microstructures formed by silicon wafer bonding
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Design of sealed cavity microstructures formed by silicon wafer bonding

机译:硅片键合形成的密封腔微结构设计

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摘要

Three fabrication issues related to the design and fabrication of micromechanical devices using sealed cavities within bonded silicon wafers are discussed. The first concerns the resultant residual gas pressure within a sealed cavity between two bonded wafers after bonding and a high-temperature anneal. The second concerns the prediction of plastic deformation in capping layers of single-crystal silicon over sealed cavities. Exposure of sealed cavity structures to a high-temperature environment causes the trapped residual gas to expand, which can result in the plastic deformation of the capping layer. A model for analytically predicting the occurrence of plastic deformatio in these silicon capping layers has been developed. The third fabrication issue concerns the prediction of the resultant height of plastically deformed capping layers of silicon after cooling. A model which gives a lower and an upper bound on the height, based on an analytical spherical shell membrane stress equation, has been developed.
机译:讨论了与在键合的硅晶片内使用密封腔的微机械装置的设计和制造有关的三个制造问题。第一个问题涉及键合和高温退火后两个键合晶片之间的密封腔内的最终残余气压。第二个问题是关于密封腔上单晶硅覆盖层中塑性变形的预测。密封腔体结构暴露在高温环境中会导致捕获的残留气体膨胀,这可能导致覆盖层发生塑性变形。已经建立了用于分析预测在这些硅覆盖层中塑性变形的发生的模型。第三个制造问题涉及冷却后硅塑性覆盖层的合成高度的预测。基于解析球壳膜应力方程,建立了给出高度上下限的模型。

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