Using reverse-tone bilayer etch in ultraviolet nanoimprint lithography

摘要

While nanoscale feature replication using imprinting or micro-molding techniques has existed for several years, it was first suggested as a potential patterning approach nearly 50 years ago. Richard Feynmann, in his famous 1959 lecture "There's Plenty of Room at the Bottom: An Invitation to Enter a New Field of Physics," discussed the creation and mold-based replication of nanoscale features. He correctly predicted that the original mold (template) can be written using a version of electron-beam lithography and discussed the possibility of taking a metal mold (template) and making multiple copies: "We would just need to press the same metal plate again into plastic and we would have another copy."