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Enhanced Morphological Stability in Sb-Doped Ge

机译:掺Sb的Ge中增强的形态稳定性

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The axial heat processing (AHP) crystal growth technique was used to investigate the morphological stability of faceted solid/liquid (s/l) interfaces. Six Sb-doped Ge single crystals containing 2.3 × 10?2 to 2.3 × 10?1 at. pct Sb were grown at pulling rates of 10 to 20 mm/h. These include two bicrystals specifically designed to investigate the effect of slight misorientation on stability. Faceted growth with a kinetic supercooling on the order of 0.15 K was achieved, and a characteristic two-dimensional W instability boundary, an inverted crater in three dimensions, was observed. The crystals exhibited enhanced morphological stability over the predictions of the constitutional supercooling (CS) criterion and the Mullins and Sekerka (MS) stability criterion, with the highest stability in the center of the W. These results are examined with current analytical stability theories accounting for convection and kinetics. An alternate model is proposed based on anisotropic kinetics and the competition between lateral spreading on a faceted interface and the amplification rate of an interfacial perturbation.
机译:使用轴向热处理(AHP)晶体生长技术研究刻面固/液(s / l)界面的形态稳定性。 6个Sb掺杂的Ge单晶,原子浓度为2.3×10?2 至2.3×10?1 。 pct Sb以10至20 mm / h的提拉速度生长。其中包括两个专门设计用于研究轻微取向错误对稳定性的影响的双晶体。用0.15 K量级的动力学过冷实现了刻面生长,并且观察到了特征性的二维W不稳定性边界,即三个维度的倒凹坑。晶体在构造过冷(CS)准则和Mullins和Sekerka(MS)稳定性准则的预测范围内表现出增强的形态稳定性,在W中心具有最高的稳定性。这些结果用当前的分析稳定性理论进行了检验对流和动力学。基于各向异性动力学以及刻面界面上的横向扩展与界面扰动的放大率之间的竞争,提出了一种替代模型。

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