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Comparison between i_g integration and v_(gs) derivation methods dedicated to fast short-circuit 2D diagnosis for wide bandgap power transistors

机译:I_G集成与V_(GS)推导方法的比较专用于宽带隙功率晶体管的快速短路2D诊断

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This study presents and compares two original high-speed protection circuit methods, namely, i_g integration and v_(gs) derivation, against short-circuit types, referred to as, the hard switch fault and fault under load. Since the gate-drain capacitor C_(gd) of a power device depends on the drain to source voltage v_(ds),it can become an original native sensor to monitor the switching operation and so detect the unwanted v_(ds) transition or the absence of the v_(ds) transition by monitoring only v_(gs). The use of only low-voltage monitoring, such as υ_(gs), is an essential step to integrate fast and embedded new detection methods into a low-voltage application-specific integrated circuit gate driver, in particular for wide bandgap power transistors. The C_(gd) capacitor plays a major part in the two detection methods. The first method is based on dedicated two-dimensional monitoring of the gate charge transferred in a time interval combined with gate voltage monitoring. The second method consists of the reconstruction of the dv_(gs)/dt by means of a capacitive current sensing to provide the v_(gs) derivation combined with the v_(gs) monitoring. Comparison and simulation of the methods based on a C2M0025120D SiC MOSFET device under LTspice™ are made to verify the validity of the methods. In terms of detection speed of the short circuit, a detection time of 200 ns is obtained for both methods. Experimental waveforms based on C3M0120090J SiC MOSFET device were included into LTspice™ to push furthermore the methods to their limits and validate the approaches. Both methods are easy to design and to integrate. However, the robustness and the speed of detection trade-off of all these methods should be analysed and compared relative to the critical functionalities.
机译:本研究介绍并比较了两个原始的高速保护电路方法,即I_G集成和V_(GS)导出,对抗短路类型,称为硬盘驱动器故障和负载故障。由于功率器件的栅极 - 漏极电容器C_(GD)取决于漏极到源电压V_(DS),因此它可以成为监控切换操作的原始本机传感器,因此检测不需要的V_(DS)转换或通过仅监视V_(GS),缺少V_(DS)转换。仅使用低压监测(例如υ_(GS))是将快速和嵌入式新检测方法集成到低压应用专用集成电路栅极驱动器中的基本步骤,特别是对于宽带隙功率晶体管。 C_(GD)电容器在两种检测方法中播放主要部分。第一方法基于以栅极电压监测的时间间隔传送的栅极电荷的专用二维监测。第二种方法包括通过电容电流检测来重建DV_(GS)/ DT,以提供与V_(GS)监视组合的V_(GS)导出。基于C2M0025120D SiC MOSFET设备的比较和仿真在LTSPICE™下进行了验证了方法的有效性。在短路的检测速度方面,为两种方法获得200ns的检测时间。基于C3M0120090J SIC MOSFET器件的实验波形被纳入LTSPICE™,以推动其限制的方法并验证方法。两种方法都易于设计和集成。然而,应分析所有这些方法的鲁棒性和检测权衡速度,并相对于关键功能进行比较。

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