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机译:GaN功率晶体管的性能比较和器件设计问题的研究
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
Electronics and Opto-Electronics Research Laboratory (EOL), ITRI Rm. 386, Bldg.11, 195, Sec.4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.;
gallium nitride (GaN); field-effect transistor (FET); 2-DEG; normally-off;
机译:SiON / III-氮化物界面性能对基于GaN的电力场效应晶体管器件性能的影响
机译:大功率微波应用中AlGaN / GaN金属绝缘体半导电异质结场效应晶体管的分析性能评估及其与常规HFET的比较
机译:GaN功率晶体管如何驱动高性能激光雷达:利用GaN FET产生超快脉冲功率
机译:GaN功率晶体管的性能比较和器件设计问题的研究
机译:通过基于Monte Carlo粒子的器件仿真对GaN高电子迁移率晶体管和热电子晶体管进行建模和设计。
机译:a图品质因数的高性能感应电能传输链路的设计植入微电子器件
机译:alGaN / GaN高电子迁移率晶体管器件物理缺陷与性能的相关性