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机译:衬底温度对Ti-Ni-Cu三元合金溅射膜形状记忆行为的影响
Department of Mechanical & System Engineering, University of Hyogo,2167 Shosha, Himeji, Hyogo, 671-2280, Japan;
Department of Mechanical & System Engineering, University of Hyogo,2167 Shosha, Himeji, Hyogo, 671-2280, Japan;
Department of Mechanical & System Engineering, University of Hyogo,2167 Shosha, Himeji, Hyogo, 671-2280, Japan;
Department of Mechanical & System Engineering, University of Hyogo,2167 Shosha, Himeji, Hyogo, 671-2280, Japan;
shape memory alloy; thin films; magnetron sputtering; crystalline growth; actuator;
机译:溅射沉积Ti-Ni-Cu形状记忆合金薄膜的特性
机译:富钛Ti-Ni-Cu合金薄膜的相变行为和形状记忆特性
机译:在聚酰亚胺衬底上形成的Ti-Ni-Cu形状记忆合金薄膜
机译:衬底温度对Ti-Ni-Cu三元合金溅射膜形状记忆行为的影响
机译:溅射沉积合成和薄膜表征:非晶碳和氮化钛形状记忆合金。
机译:不同沉积条件下TINI形状记忆合金薄膜的晶粒尺寸和相变行为
机译:低温结晶对溅射沉积的Ti-Ni非晶薄膜形状记忆行为及微观结构的影响