SiC Epitaxial Reactor Cleaning by ClF_3 Gas with the Help of Reaction Heat

摘要

A silicon carbide epitaxial reactor cleaning process was designed accounting for the exothermic reaction heat between silicon carbide and chlorine trifluoride gas. To avoid the peeling of the susceptor surface coating film, the spontaneous temperature increase due to the exothermic reaction heat was moderated by adding the nitrogen gas. The particle-type silicon carbide deposition could be effectively removed without causing any damage of susceptor.