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Optimization of the SiC Powder Source Size Distribution for the Sublimation Growth of Long Crystals Boules

机译:优化SiC粉末源尺寸分布的长晶体升华生长

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The influence of four different SiC source powder size distributions on the sublimation behavior during physical vapor transport growth of SiC was studied. The growth processes were carried out in a 3 inch crystal growth setup and observed in situ using advanced 3D computed tomography X-ray visualization. The single modal D90 size distribution of two source powders was 50 μm and 200 μm, respectively, with a corresponding average powder density of 1.17 g/cm3. The third source powder consisted of a blend of the previously named powders and exhibited an average powder density of 1.66 g/cm3 with a bimodal particle size distribution. The last source was composed of a solid polycrystalline SiC cylinder. The bimodal powder source exhibited a smoother morphology change and material consumption during the growth run and led to a much more stable shape change of the growth interface compared to the single modal source powders. The solid source featured the least morphology change. Therefore, with a careful adaption of the source material stable growth conditions can be achieved.
机译:研究了四种不同SiC源粉末尺寸分布对SiC物理蒸气运输生长期间升华行为的影响。生长过程在3英寸的晶体生长设置中进行,并使用先进的3D计算断层扫描X射线可视化原位观察。两个光源粉末的单个模态D90尺寸分布分别为50μm和200μm,相应的平均粉末密度为1.17g / cm3。第三源粉末由预先称为粉末的混合物组成,并具有1.66g / cm 3的平均粉末密度,具有双峰粒度分布。最后一个源由固体多晶硅缸组成。双峰粉末源在生长过程中表现出更光滑的形态变化和材料消耗,与单个模态源粉末相比,生长界面的更稳定的形状变化。固体源是最少的形态变化。因此,通过仔细适应来源材料稳定的生长条件可以实现。

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