Effects of assisting ion energy and current on MgOfilms fabricated by ion-beam-assisted sputteringdeposition

摘要

MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesiumtarget. Effects of assisting ion energy E_a and current density J_a on the orientation and surfacemorphology of the films were analysed in detail. The results show that moderate E_a and J_a couldenhance the crystallinity, but high E_a and J_a can destroy the crystallinity of the films. Assistingion energy E_a is an important factor for orientation selection, and the formation of (100)orientation needs high Ea and low J_a.