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Monolithic Two-Dimensional GaAs/AlGaAs Laser Arrays Fabricated by Chlorine Ion-Beam-Assisted Micromachining

机译:氯离子束辅助微加工制备单片二维Gaas / alGaas激光器阵列

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Chlorine ion-beam-assisted etching (IBAE) has been used to micromachine laserfacets and deflecting mirrors for monolithic two-dimensional GaAs/AlGaAs laser arrays. Three laser cavity/deflector designs have been successfully implemented. The first utilizes a parabolic deflecting mirror to directly focus the laser radiation; the second consists of a folded cavity with a vertical facet, a top surface facet, and an internal 45 reflector; and a third has a folded cavity with an internal Al0.2Ga0.8As/Al0.8Ga0.2As dielectric mirror stack and a top surface facet formed in a single etch step with two internal 45 reflectors. The parabolic deflecting mirrors are currently molded for f-0.8 collection efficiency, making the first design attractive in incoherent arrays for high-power applications such as pumping Nd:YAG lasers. The other two structures are of interest for incoherent

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