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机译:Bi掺杂对共溅射沉积碲化铋锑薄膜热电性能的影响
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, China;
a. thin film; b. sputtering; c. electron microscopy; c. x-ray diffraction; d. electrical properties;
机译:温度和尺寸对共溅射沉积碲化铋薄膜电性能和热电功率的影响
机译:RF磁控溅射沉积功率对柔性基材锑碲化酰胺结晶度和热电性能的影响
机译:磁控溅射沉积Pb掺杂碲化铋薄膜的热电性能
机译:通过射频磁控溅射沉积的碲化铋薄膜的热电性能
机译:基于碲化铋和碲化锑的共蒸发热电薄膜:技术,特性和优化。
机译:碲化铋薄膜的热电性能从非水溶液中电沉积的薄膜
机译:闪蒸沉积n型纳米晶碲化铋基薄膜的热电性能
机译:铋锑薄膜的热电性能。