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Tribological and electrical properties of TiO_2 thin films for polymer insulator as the dielectric coating of electric railroad

机译:高分子绝缘子用TiO_2薄膜的电气摩擦涂层的摩擦学和电学性能

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摘要

TiO_2 thin films were deposited on glass and polymer insulator substrates as self-cleaning coatings, TiO_2 films were deposited at various RF powers by the unbalanced RF magnetron sputtering method using a TiO_2 ceramic target. We investigated the tribological, structural, and electrical properties of the deposited TiO_2 films at various RF powers. The result showed that the hardness and elastic modulus values of the TiO_2 films increased with the increase of RF power. The surface roughness and contact angle values also increased with the increase of RF power. Also, the rms leakage currents of the TiO_2 films were low for the insulator coating layer. The TiO_2 films fabricated in this work are suitable for the protection of polymer insulators because of their low leakage current and good tribological properties.
机译:TiO_2薄膜作为自清洁涂层沉积在玻璃和聚合物绝缘体基底上,使用TiO_2陶瓷靶通过不平衡RF磁控溅射方法以各种RF功率沉积TiO_2薄膜。我们研究了在各种射频功率下沉积的TiO_2薄膜的摩擦学,结构和电学性质。结果表明,随着RF功率的增加,TiO_2薄膜的硬度和弹性模量值增加。随着RF功率的增加,表面粗糙度和接触角值也增加。另外,对于绝缘体涂层,TiO_2膜的均方根泄漏电流低。这项工作中制备的TiO_2薄膜由于漏电流低且具有良好的摩擦学性能,因此适合于聚合物绝缘子的保护。

著录项

  • 来源
    《Materials Research Bulletin》 |2014年第10期|44-48|共5页
  • 作者单位

    Korea Railroad Research Institute, 176, Cheoldobangmulgwan-ro, Uiwang 437-757, Republic of Korea;

    Korea Railroad Research Institute, 176, Cheoldobangmulgwan-ro, Uiwang 437-757, Republic of Korea;

    School of Electronic and Electrical Engineering, Sungkyunkwan University, 2066, Seoburo, Jangan-Gu, Suwon 440-746, Republic of Korea;

    Department of Photoelectronics, Chosun College of Science & Technology, 309-1, Pilmundaero, Dong-Gu, Gwangju 501-744, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TiO_2; Polymer insulator; Unbalanced magnetron sputtering; Hardness; Rms leakage current;

    机译:TiO_2;聚合物绝缘子;不平衡磁控溅射;硬度;均方根漏电流;

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