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首页> 外文期刊>Materials Research Bulletin >Effect of indium concentration on electrochemical properties of electrode-electrolyte interface of CuIn1-xGaxSe2 prepared by electrodeposition
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Effect of indium concentration on electrochemical properties of electrode-electrolyte interface of CuIn1-xGaxSe2 prepared by electrodeposition

机译:铟浓度对电沉积制备的CuIn1-xGaxSe2电极-电解质界面电化学性能的影响

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摘要

In this study, the electrochemical impedance spectroscopy (EIS) technique was used to investigate the electrochemical behavior of the interface between the Mo electrode and the Cu-In-Ga-Se electrolyte. In this electrodeposition system, the main parameters include (1) various deposition times, and (2) the effect of In3+ concentration on the diffusion processes, electrical double layer, charge transfer resistance, and Warburg impedance. Experimental results revealed that the electrochemical kinetic behavior of CIGS thin film is strongly influenced by (1) the electrical double layer existing between the substrate, and (2) the electrolyte with different concentrations of In3+. With an increase in the electrodeposition time, the kinetic behavior of this electrodeposition system was gradually dominated by the diffusion process rather than charge transfer process. (C) 2017 Elsevier Ltd. All rights reserved.
机译:在这项研究中,电化学阻抗谱(EIS)技术用于研究Mo电极和Cu-In-Ga-Se电解质之间的界面的电化学行为。在该电沉积系统中,主要参数包括(1)各种沉积时间,以及(2)In3 +浓度对扩散过程,双电层,电荷转移电阻和Warburg阻抗的影响。实验结果表明,CIGS薄膜的电化学动力学行为受(1)存在于基材之间的双电层以及(2)具有不同In3 +浓度的电解质的强烈影响。随着电沉积时间的增加,该电沉积系统的动力学行为逐渐由扩散过程而非电荷转移过程所支配。 (C)2017 Elsevier Ltd.保留所有权利。

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