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Electrodeposition of ferromagnetic nanowire arrays on AAO/Ti/Si substrate for ultrahigh-density magnetic storage devices

机译:用于超高密度磁存储设备的AAO / Ti / Si衬底上的铁磁纳米线阵列的电沉积

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摘要

Fe, Co, and Ni nanowire arrays have now been extended to directly fabricate on AAO/Ti/Si substrate by direct current (DC) electrodeposition, respectively. AAO/Ti/Si substrate is synthesized by a two-step electrochemical anodization of the aluminum film on the Ti/Si substrate and then used as template to grow Fe, Co, and Ni nanowire arrays with 20 nm diameters. The properties of samples are tested by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), and vibrating sample magnetometer (VSM).
机译:Fe,Co和Ni纳米线阵列现已扩展为分别通过直流(DC)电沉积直接在AAO / Ti / Si衬底上制造。通过对Ti / Si基板上的铝膜进行两步电化学阳极氧化合成AAO / Ti / Si基板,然后将其用作模板以生长直径为20 nm的Fe,Co和Ni纳米线阵列。样品的性能通过场发射扫描电子显微镜(FESEM),透射电子显微镜(TEM),X射线衍射(XRD)和振动样品磁力计(VSM)进行测试。

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