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Electrodeposition and magnetic properties of Ni nanowire arrays on anodic aluminum oxide/Ti/Si substrate

机译:阳极氧化铝/ Ti / Si衬底上Ni纳米线阵列的电沉积和磁性能

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Ni nanowire arrays with different diameters have now been extended to directly fabricate in porous anodic alumina oxide (AAO) templates on Ti/Si substrate by direct current (DC) electrodeposition. An aluminum film is firstly sputter-deposited on a silicon substrate coated with a 300 nm Ti film. AAO/Ti/Si substrate is synthesized by a two-step electrochemical anodization of the aluminum film on the Ti/Si substrate and then used as template to grow Ni nanowire arrays with different diameters. The coercivity and the squareness in parallel direction of Ni nanowires with about 10 nm diameters are 664 Oe and 0.90, respectively. The Ni nanowire arrays fabricated on AAO/Ti/Si substrates should lead to practical applications in ultrahigh-density magnetic storage devices because of the excellent properties. (c) 2006 Elsevier B.V. All rights reserved.
机译:现在已经扩展了具有不同直径的Ni纳米线阵列,以通过直流(DC)电沉积直接在Ti / Si基板上的多孔阳极氧化铝(AAO)模板中制造。首先将铝膜溅射沉积在涂有300 nm Ti膜的硅基板上。通过对Ti / Si基板上的铝膜进行两步电化学阳极氧化合成AAO / Ti / Si基板,然后将其用作模板以生长具有不同直径的Ni纳米线阵列。直径约10 nm的Ni纳米线的平行方向的矫顽力和矩形度分别为664 Oe和0.90。由于其优异的性能,在AAO / Ti / Si衬底上制造的Ni纳米线阵列应在超高密度磁存储设备中得到实际应用。 (c)2006 Elsevier B.V.保留所有权利。

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