Generating nanocrystalline metallic oxide and metal mixed oxide layers on barrier layer-forming metals e.g. aluminum of substrate, comprises anodically degreasing the substrate in galvanic electrolysis and then anodizing in electrolytes

摘要

The method for generating nanocrystalline or nanocrystal-containing metallic oxide and metal mixed oxide layers on barrier layer-forming metals e.g. aluminum of a substrate, comprises cleaning and anodically degreasing the substrate in a galvanic electrolysis with an aqueous electrolytes, in which the metals and/or compounds to be applied are contained, anodizing the substrate in the electrolytes under spark discharge with direct current voltage and/or direct current voltage impulses and temporal change of the voltage up to a coating final voltage, and washing and drying the coated substrate. The method for generating nanocrystalline or nanocrystal-containing metallic oxide and metal mixed oxide layers on barrier layer-forming metals e.g. aluminum of a substrate, comprises cleaning and anodically degreasing the substrate in a galvanic electrolysis with an aqueous electrolytes, in which the metals and/or their compounds to be applied are contained, anodizing the substrate in the electrolytes under spark discharge with direct current voltage and/or direct current voltage impulses and temporal change of the voltage up to a coating final voltage, washing the coated substrate after the electrolysis for the cleaning of electrolytes and then drying the substrate. The substrate is exposed to the anodization process without forming a titanium intermediate layer. The anodization process is interrupted at any time after reaching a predetermined temperature of the electrolytes and is continued in a renewed anodization process, in which the desired layer thickness of the metallic oxide and metal mixed oxide layer is reached on the substrate. The substrate remains in electrolytes of the galvanic electrolysis bath after interruption of the anodization process for the further coating, and is then removed and exposed for the galvanic further coating in the renewed anodization process in the same or other electrolytes. The substrate is partly immersed in the electrolytes and is subjected to the anodization process with a voltage of 230 V.