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Effect of the electrode structure on the electrical properties of alkoxide derived ferroelectric thin film

机译:电极结构对醇盐型铁电薄膜电性能的影响

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摘要

Effect of the thermal expansion coefficient of electrode on the electrical properties in lead zirconate titanate (PZT) with morphotropic phase boundary (Pb(Zr_(0.53),Ti_(0.47))O_3: MPB) composition film was demonstrated in this paper. The lanthanum nickel oxide (LaNiO_3: LNO) and lanthanum strontium cobalt oxide ((La_(0.5),Sr_(0.5))CoO_3: LSCO) was deposited by chemical solution deposition (CSD) as bottom electrode on Si wafer. Highly (100)-oriented LSCO layers were successfully prepared by CSD on Si wafer using (100)-oriented LNO layers as seeding layer for the crystal orientation control. As a result, (100) and (001) oriented PZT film was also successfully prepared on LSCO/LNO/Si stacking structure. The obtained dielectric and ferroelectric properties changed according to the thermal stress which was influenced by the bottom electrode thickness.
机译:本文介绍了电极的热膨胀系数对具有相变相界(Pb(Zr_(0.53),Ti_(0.47))O_3:MPB)组成的锆钛酸铅(PZT)的电性能的影响。通过化学溶液沉积(CSD)将氧化镧镧镍(LaNiO_3:LNO)和镧锶钴氧化物((La_(0.5),Sr_(0.5))CoO_3:LSCO)作为底部电极沉积在Si晶片上。使用(100)取向的LNO层作为晶种控制晶种,通过CSD在Si晶片上成功制备了高度(100)取向的LSCO层。结果,还成功地在LSCO / LNO / Si堆叠结构上制备了(100)和(001)取向的PZT膜。所获得的介电和铁电特性根据受底部电极厚度影响的热应力而改变。

著录项

  • 来源
    《Materials Letters》 |2010年第15期|P.1742-1744|共3页
  • 作者单位

    Department of Materials Science and Engineering, Kitami Institute of Technology, 165 Kouen-chi, Kitami, Hokkaidoh 090-8507, Japan;

    rnDepartment of Materials Science and Engineering, Kitami Institute of Technology, 165 Kouen-chi, Kitami, Hokkaidoh 090-8507, Japan;

    rnDepartment of Materials Science, Shizuoka University, 3-5-1, Johoku, Hamamatsu, Shizuoka 432-8561, Japan;

    Department of Materials Science, Shizuoka University, 3-5-1, Johoku, Hamamatsu, Shizuoka 432-8561, Japan;

    Department of Materials Science, Shizuoka University, 3-5-1, Johoku, Hamamatsu, Shizuoka 432-8561, Japan;

    Technical Division, Kitami Institute of Technology, 165 Kouen-cho, Kitami, Hokkaido 090-8507, Japan;

    rnDepartment of Materials Science, Shizuoka University, 3-5-1, Johoku, Hamamatsu, Shizuoka 432-8561, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; ferroelectrics; stress engineering; chemical solution deposition;

    机译:薄膜;铁电体压力工程;化学溶液沉积;

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