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GaN nanowires grown on silicon substrates engraved using stainless-steel micro-tip

机译:使用不锈钢微尖端雕刻在硅基板上生长的GaN纳米线

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摘要

GaN nanostructures have been synthesized on silicon substrates using chemical vapor deposition. Prior to growth silicon substrates were engraved using stainless-steel micro-tips. Straight as well as twisted nanowires were observed along the engraved lines/regions. Straight nanowires were few tens of microns in length and the twisted ones were few microns in length with diameter variation between 30 nm and 100 nm. The electron microscopy analysis indicates that the nanowires were grown parallel to the c-axis and possible growth mechanism is described. Raman scattering indicates good quality of nanowires exhibiting intense E_2 (high) mode and A,(LO) mode and a huge red-shift in the mode position indicates nano-size effects. Such engraved substrates without any explicit catalyst can provide site controlled growth of nanowires and this methodology is extendable for growing nanowires of related materials.
机译:GaN纳米结构已使用化学气相沉积法在硅基板上合成。在生长之前,使用不锈钢微尖端雕刻硅基板。沿着刻线/区域观察到直的和扭曲的纳米线。直的纳米线的长度只有几十微米,而扭曲的纳米线的长度只有几微米,直径在30纳米到100纳米之间变化。电子显微镜分析表明,纳米线平行于c轴生长,并描述了可能的生长机理。拉曼散射表明纳米线的质量好,表现出强烈的E_2(高)模和A,(LO)模式,且模式位置的巨大红移表明纳米尺寸效应。无需任何显式催化剂的此类雕刻基材可以提供纳米线的位置控制生长,并且该方法可扩展为生长相关材料的纳米线。

著录项

  • 来源
    《Materials Letters》 |2011年第16期|p.2398-2400|共3页
  • 作者单位

    Department of Physics, Indian Institute of Technology Kanpur, 208016, India;

    Department of Physics, Indian Institute of Technology Kanpur, 208016, India,Department of Mechanical Engineering, Indian Institute of Technology Kanpur, 208016, India;

    Department of Mechanical Engineering, Indian Institute of Technology Kanpur, 208016, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    chemical vapor deposition; semiconductors; raman; nanowires; gan;

    机译:化学气相沉积;半导体;拉曼;纳米线;甘;

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