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首页> 外文期刊>材料技術 >Asymmetric Hysteresis Loops and Leakage Current Behaviors in Au/PZT/Pt/Al_2O_3/SiO_2/Si Thin Films Prepared by MOCVD Method
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Asymmetric Hysteresis Loops and Leakage Current Behaviors in Au/PZT/Pt/Al_2O_3/SiO_2/Si Thin Films Prepared by MOCVD Method

机译:MOCVD法制备的Au / PZT / Pt / Al_2O_3 / SiO_2 / Si薄膜的不对称磁滞回线和漏电流行为

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摘要

The polarization-voltage (P-V) and leakage currents density (J-V) characteristics were investigated on the ferroelectric PZT films deposited on Pt/A_l2O_3/SiO_2/Si substrate with a vapor-deposited gold top electrode. The P-V hysteresis loops and the J-V characteristics were measured after performing a rapid thermal annealing (RTA) process. A ferroelectric test system (Precision LC Radiant Technology) was used to measure their electrical properties with a 90-nm PZT thickness and an area of 7.85×10~(-5) cm~2. The measurements were taken by connecting a Pt bottom electrode to the drive of the precision LC and the Au top electrode to the drive of the precision LC. The P-V hysteresis and J-V characteristics of PZT samples showed the asymmetry for both measurements. The asymmetric hysteresis loops and leakage current behavior were shifted in the positive direction when the drive was applied to the Pt electrode, while being negatively shifted in the converse case. The asymmetric behavior of the polarized state in the hysteresis loops due to the electrode configuration resulted from different work function between the Pt and Au electrodes, further influencing the leakage current behavior.
机译:研究了在具有气相沉积金顶电极的Pt / A_l2O_3 / SiO_2 / Si衬底上沉积的铁电PZT膜的极化电压(P-V)和泄漏电流密度(J-V)特性。在执行快速热退火(RTA)工艺后,测量了P-V磁滞回线和J-V特性。使用铁电测试系统(Precision LC Radiant Technology)以90 nm PZT厚度和7.85×10〜(-5)cm〜2的面积测量其电性能。通过将Pt底部电极连接到精密LC的驱动器以及将Au顶部电极连接到精密LC的驱动器来进行测量。 PZT样品的P-V磁滞和J-V特性显示两种测量均不对称。当将驱动器施加到Pt电极时,非对称磁滞回线和泄漏电流行为沿正方向移动,反之则为负方向。由于Pt和Au电极之间的功函数不同,电极结构导致的磁滞回线中极化态的不对称行为,进一步影响了漏电流行为。

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